Özet:

Influence of boron impurities on electron-transport in crystalline silicon is well known because p-Si – basic semiconducting material of the modern microelectronics – usually is obtained by doping with B. It is too important to understand the mechanism interaction of B dopants with radiation defects in silicon to (i) develop effective radiation treatment technologies for electronic devices and integrated circuits, (ii) improve their radiation resistance, and (iii) design effective solid-state radiation sensors and detectors. Based on authors’ previous works the role of B-impurities in formation of secondary radiation defects in Si crystals is investigated. Dependences of these processes on isochronous annealing temperature (80–600 °C) are studied by using the Hall measurements of temperature-dependencies (100–300 K) of holes’ concentration and mobility in silicon before and after irradiation with 8 MeV electrons at the dose of 5∙1015 cm–2. Two main conclusions are made: boron atoms in silicon crystals (i) serve as extremely active sinks of radiation defects, and (ii) participate in space-charge-screening of the relatively high-conductive inclusions in form of clusters of radiation defects. Author Biographies Temur Pagava, Georgian Technical University Kostava 77, Tbilisi, Georgia, 0175 Professor, Doctor of Physical-Mathematical Sciences Department of Engineering Physics

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